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Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

PRODUCTS AND SERVICES > Inline Equipment Series > Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.


Equipment Name:

Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD


Equipment Model:

PAR5500A


Equipment Application:

In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.


Coating Principle:

1、Magnetron Sputter (PVD).

2、Reactive Plasma Deposition (RPD).


Features:

1、Multiple cathode operation for seed layer and multiple refractive index tandem TCO.

2、No bombardment on the substrate while keeping high mobility.


Parameters:



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